Drawing on the broad expertise, Sumitomo Chemical Co., Ltd. (SCC) has accumulated over many years as a diversified chemical company.
SCC has developed positive-type photoresist.
Along with the advancement of nanotechnology, the critical resolution of photoresist is being controlledwith increased precision,from half a micron down to a tenth micron and below. Inanticipation of ever growing and diversifying customer needs,SCC is redoubling its development efforts for more advanced i-line, KrF, ArF, and newer generation ArF Immersion photoresist.

i-line: for all critical and non-critical applications
KrF: for all critical and non-critical applications
ArF: both dry and immersion applications
E-Beam: negative type for all photomask and other direct write applications
EUV: for all EUV applications
 

Contact window:
Steve.Perng +886 3 571-1499 # 303
Steve.Perng@mail.sumitronics.com.tw